摘要 |
<p>PURPOSE: A transfer chamber with a plate for heat exchange and semiconductor manufacturing equipment with the same are provided to heat a substrate at a temperature which is required until a substrate is inserted into a process chamber, thereby increasing profitability by preventing the waste of heat energy. CONSTITUTION: A chamber base(170) forms the lower surface of a transfer chamber(100) making a moving space in which a substrate is transferred. At least one plate(110) is installed in the chamber base to exchange heat with the substrate. The plate comprises a heater supplying heat to the substrate A shelf(140) transfers a substrate to the transfer robot and the plate. A jetting nozzle(180) supplies nitrogen and/or a helium gas to the transfer chamber.</p> |