发明名称 Semiconductor device with backfilled isolation
摘要 An MOS device has an embedded dielectric structure underlying an active portion of the device, such as a source extension or a drain extension. In an alternative embodiment, an embedded dielectric structure underlies the channel region of a MOS device, as well as the source and drain extensions.
申请公布号 US7936006(B1) 申请公布日期 2011.05.03
申请号 US20050244566 申请日期 2005.10.06
申请人 XILINX, INC. 发明人 LUO YUHAO;NAYAK DEEPAK KUMAR;GITLIN DANIEL
分类号 H01L29/66 主分类号 H01L29/66
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