发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.
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申请公布号 |
US7936447(B2) |
申请公布日期 |
2011.05.03 |
申请号 |
US20060429451 |
申请日期 |
2006.05.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DERKSEN ANTONIUS THEODORUS ANNA MARIA;SMEETS ERIK MARIE JOSE;OCKWELL DAVID CHRISTOPHER;LENDERS HENRICUS JOZEF PETER |
分类号 |
G03B27/58;H01L21/76 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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