| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sintered target on which a deposited film having sedimented on a non-erosion part resists exfoliating from the target surface even in a continuous sputtering process in mass production, and a nodule and arcing resist occurring. <P>SOLUTION: The sintered target for use in producing a thin film containing zinc oxide as a main component has a thin film which contains zinc oxide orienting in the c-axis direction as the main component formed on a face to be sputtered of a sintered target that becomes the base, as a seed film with a film thickness of 20 nm or more. A method for manufacturing the sintered target for use in producing the thin film containing zinc oxide as the main component includes forming the seed film which contains zinc oxide orienting in the c-axis direction as the main component and has the film thickness of 20 nm or more, on the face to be sputtered of the sintered target that becomes the base, by using a target for forming the seed film having substantially the same composition as that of the sintered target, with a sputtering technique. <P>COPYRIGHT: (C)2011,JPO&INPIT |
