| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a light permeable electromagnetic shield material in which an electromagnetic wave shield layer having uniform thickness and line width and showing high electromagnetic wave shield properties is efficiently formed. SOLUTION: The method of manufacturing the light permeable electromagnetic shield material includes the processes of: forming a patterned resin layer 130 by printing a synthetic resin composition containing a silane coupling agent having at least one amino group or ureido group in a patterned shape on a surface processing layer 120, containing a compound having an anionic group, of a transparent base 110 having the surface processing layer 120 formed on one surface; providing a patterned plating catalyst layer 140 by forming the plating catalyst layer on the resin layer by bringing a plating catalyst compound solution into contact with the transparent base 110 having the surface processing layer 120 and patterned resin layer 130; and providing a patterned metal conductive layer 150 by forming the metal conductive layer on the plating catalyst layer 140 by performing electroless plating and/or electrolytic plating. COPYRIGHT: (C)2011,JPO&INPIT
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