发明名称 Troika Acid Semiconductor Cleaning Compositions and Methods of Use
摘要 Semiconductor processing compositions for use with silicon wafers having an insulating layers, and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as a, α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.
申请公布号 US2011094536(A1) 申请公布日期 2011.04.28
申请号 US20100889665 申请日期 2010.09.24
申请人 LEE WAI MUN 发明人 LEE WAI MUN
分类号 C23G5/036;C09K13/00 主分类号 C23G5/036
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