| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition excellent in sensitivity, resolution, roughness characteristics, pattern profiles and outgas characteristics; and to provide an active ray-sensitive or radiation-sensitive resin composition, which is curable with high sensitivity by irradiation with active rays or radiation, has excellent coloring property, image forming property and adhesiveness to a recording medium, has good storage stability and discharge stability and is suitable for inkjet recording. <P>SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains a sulfonium salt having an aryl group substituted with at least one alkoxyalkyl group or cycloalkoxyalkyl group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
