SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technique for efficiently heating a gas required for a heating treatment of a substrate. SOLUTION: This substrate processing device 1 includes a heating plate 10 formed with a gas passage 103 extending along a heating surface of a heater 14 in the inside. Air supplied into a heating plate 110 from a gas supply mechanism 16 is heated by passing through the gas passage 103. The heated air passes through an introduction opening 121 and enters a diffusion passage 102. The air is diffused in the diffusion passage 102, and ejected toward a substrate 9 from a plurality of ejection openings 101 formed on the upper surface of the heating plate 10. In such a substrate processing device 1, the air can be efficiently heated by utilizing the heat of the heating plate 10. COPYRIGHT: (C)2011,JPO&INPIT