发明名称 FEEDING MECHANISM FOR CONTINUOUS PROCESSING OF ELONGATE BASE MATERIAL, PROCESSING APPARATUS AND THIN FILM FORMING APPARATUS USING THE SAME, AND ELONGATE MEMBER PRODUCED THEREBY
摘要 A feeding mechanism, having a base station to which an elongate base material is continuously fed to be physically or chemically processed at a prescribed speed and from which the processed base material is continuously recovered, wherein tensile force T1 in a direction opposite to a feeding direction is applied at a supply side of the base station, frictional force F is applied at the base station and tensile force T2 in the feeding direction is applied at the recovery side of the base station, on said base material, with these forces satisfying the relation of F>T1>T2, is provided. A feeding mechanism for feeding a base material for performing physical or chemical processing with high accuracy while an elongate base material is continuously fed, particularly a feeding mechanism that suppresses thickness variation along the lengthwise direction or surface damage at a portion where a function is added of the processed base material, can be obtained.
申请公布号 US2011095121(A1) 申请公布日期 2011.04.28
申请号 US20110985655 申请日期 2011.01.06
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 AWATA HIDEAKI;EMURA KATSUJI;YOSHIDA KENTARO;OKUDA NOBUYUKI;NAKAMURA JUN
分类号 B65H20/00;B65H23/04 主分类号 B65H20/00
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