| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which can produce a resist pattern having good resolution and configuration. <P>SOLUTION: The resist composition comprises a resin comprising a structural unit derived from a monomer represented by formula (1), an acid generator and a solvent, wherein R<SP>1</SP>and R<SP>2</SP>each independently represents H or 1-4C alkyl; A<SP>1</SP>is a single bond or represents a group represented by *1-(CH<SB>2</SB>)<SB>m</SB>-CO-O-*2 or *1-(CH<SB>2</SB>)<SB>n</SB>-CO-NR<SP>3</SP>-*2 (wherein R<SP>3</SP>represents H or 1-4C alkyl; m and n each independently represents an integer of 1-6; *1 is direct link to N; *2 is direct link to B<SP>1</SP>); and B<SP>1</SP>represents a 4-20C lactone ring group which may have a substituent. <P>COPYRIGHT: (C)2011,JPO&INPIT |
