| 摘要 |
<p>The present disclosure relates to an exposure apparatus that exposes a substrate (W) with an energy beam via a projection optical system and liquid, the apparatus comprising:
a first table (TB1) that is movable while the substrate is mounted thereon;
a second table (TB2) which is movable independently from the first table and on which a substrate is mounted; and
a drive system that moves the first and second tables with respect to the projection optical system, wherein
one of the first and second tables is replaced with the other of the first and second tables while maintaining the liquid just below the projection optical system, by moving the first and second tables in a close state below the projection optical system.
</p> |
