| 发明名称 |
HALOGENATED POLYSILANE AND PLASMA-CHEMICAL PROCESS FOR PRODUCING THE SAME |
| 摘要 |
The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1. |
| 申请公布号 |
KR20110043545(A) |
申请公布日期 |
2011.04.27 |
| 申请号 |
KR20107029329 |
申请日期 |
2009.05.27 |
| 申请人 |
SPAWNT PRIVATE S.A.R.L |
发明人 |
AUNER NORBERT;BAUCH CHRISTIAN;LIPPOLD GERD;DELTSCHEW RUMEN;MOHSSENI ALA SEYED JAVAD |
| 分类号 |
C01B33/107;B01J12/00;B01J19/08;H05H1/24 |
主分类号 |
C01B33/107 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
