| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent inactive gas from the lower side of a chamber to the upper side of a substrate support by downwardly spraying the inactive gas from the upper side of the chamber. CONSTITUTION: A space unit(11) for processing a substrate is formed in a chamber(10). A substrate support(20) is rotated in the chamber. A plurality of substrate holding units(23) are formed on the upper side of the support plate. A gas spraying unit sprays process gas to the plurality of substrates on the substrate support. A partition member(40) is formed with a ring around the substrate support. |
