| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for forming a magnetic recording medium film, which allows oxygen to be properly contained in the film without lowering a deposition rate, and to provide a method for producing the same. SOLUTION: The sputtering target includes: 2-20 atom% of Cr; 5-25 atom% of Pt; and 0.5-15 atom% of a metal M (wherein the metal M is one or more of Si, Ti, Ta, and Al), and the metal M is added as a nonmagnetic oxide. Furthermore, the sputtering target has a composition in which oxygen exceeding by 0.1-5 atom% a theoretical value calculated from a formulated composition is contained as a whole, wherein the balance is composed of Co and inevitable impurities. COPYRIGHT: (C)2011,JPO&INPIT
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