发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor structure where an active region of high-indium-content with superior photoelectric characteristics grows with low possibility of having structural deterioration due to alloy segregation. <P>SOLUTION: The semiconductor structure includes: a nucleation layer; a thick InGaN layer that is grown on the nucleation layer; and an active layer that is formed on the thick InGaN layer. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011082563(A) 申请公布日期 2011.04.21
申请号 JP20100292773 申请日期 2010.12.28
申请人 THOMSON LICENSING LLC 发明人 BOUR DAVID P
分类号 H01L33/32;H01L21/203;H01L21/205;H01L33/00;H01S5/00;H01S5/323;H01S5/343 主分类号 H01L33/32
代理机构 代理人
主权项
地址