发明名称 PLATING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a plating equipment efficiently forming a plating layer having uniform thickness on a base material particle having electrical conductivity. SOLUTION: The plating equipment for the base material particle having electrical conductivity includes: a plating bath 11 provided with a plating chamber in which a plating solution is stored; a first surface arranged in a position to be immersed in the plating solution in a state wherein the plating solution is stored in the plating chamber; a second surface arranged to face the first surface in a position to be immersed in the plating solution in the state wherein the plating solution is stored in the plating chamber and relatively movable to the first surface while keeping the positional relation to face the first surface; a gap part which is formed from the first surface and the second surface and in which particle group containing the base material particle are arranged; a cathode which is provided in the gap part; and an anode. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011080128(A) 申请公布日期 2011.04.21
申请号 JP20090234511 申请日期 2009.10.08
申请人 HITACHI METALS LTD 发明人 ITO MOTOMICHI
分类号 C25D17/16 主分类号 C25D17/16
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