| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that detects an amount of a relative position shift between a position where a projection optical system projects an exposure pattern and a detection position of a position detection optical system without moving the position detection optical system on a reverse surface side, and performs exposure with high precision using the amount of the position shift. <P>SOLUTION: The exposure device 1 includes a stage 9 where a substrate 7 is mounted, the projection optical system 4 which is disposed on a top-surface side of the substrate 7 and projects the pattern on the substrate 7, a top-surface position detection optical system 80 for detecting the projection position of the pattern by the projection optical system 4, a top-surface detection illumination optical system 70, a reverse-surface position detection optical system 6 for detecting the position of a positioning mark on the reverse-surface side of the substrate 7, an index plate 10 provided on the stage 9, and a control unit 11 which calculates the amount of the relative position shift between the projection position of the pattern by the projection optical system 4 and the detection position on the reverse-surface side by the reverse-surface position detection optical system 6. <P>COPYRIGHT: (C)2011,JPO&INPIT |
