| 摘要 |
PURPOSE: A phosphoric acid-based etchant composition is provided to reduce the used amount of phosphoric acids and to simultaneously etch a single layer or multilayered layer formed of at least one kind metal selected from aluminum-based metal and molybdenum-based metal. CONSTITUTION: A phosphoric acid-based etchant composition for a single layer or multilayered layer formed of at least one kind metal selected from aluminum-based metal and molybdenum-based metal includes, based on the total weight of the composition, 4-20 weight% of phosphoric acid(H3PO4), 36~60 weight% of nitric acid(HNO3), 36~55 weight% of acetic acids and the balance of water.
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