| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition having high developability, exposure latitude and line edge roughness performance to solve a problem of an essential performance improvement technology of microphotofabrication using far-ultraviolet light, EUV, an electron beam, or the like, especially ArF excimer laser light. <P>SOLUTION: This actinic ray- or radiation-sensitive resin composition includes a basic compound having (C)n basic groups and m groups that generate an acid by emission of actinic rays or radiation. Here, n and m satisfy the relationships n≥1, m≥2 and n<m. <P>COPYRIGHT: (C)2011,JPO&INPIT |
