发明名称 METHOD FOR MANUFACTURING PARALLAX BARRIER, AND METHOD FOR MANUFACTURING PHOTOMASK
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a parallax barrier capable of excellently displaying a three-dimensional image. <P>SOLUTION: The method for manufacturing a parallax barrier includes: a light shielding layer formation step of forming a light shielding layer on a translucent substrate; a pattern formation step of removing part of the light shielding layer, to form a plurality of substantially rectangular openings 53 so that light shielding parts 52 and the openings 53 are alternately arranged along first and second formation directions X and Y; and a cutting step of cutting the translucent substrate along a first cutting direction X' inclined to the first formation direction X by an angle &theta; and a second cutting direction Y' inclined to the second formation direction Y by the angle &theta;. In the pattern formation step, the plurality of openings 53 disposed along the first formation direction X are formed at a uniform pitch B<SB>h</SB>smaller than the ideal opening pitch in the row direction of the parallax barrier 5 prescribed based on a pixel pitch in the row direction in a display means, and are formed such that the openings are disposed stepwise shifted in the second formation direction Y and follow the first cutting direction X'. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011075625(A) 申请公布日期 2011.04.14
申请号 JP20090224200 申请日期 2009.09.29
申请人 SEIKO EPSON CORP 发明人 NAKATANI EIJI
分类号 G02B27/22;G03F1/00;G03F1/68 主分类号 G02B27/22
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