PLASMA CVD DEVICE

摘要

The disclosed plasma CVD device (1) is provided with a vacuum chamber (3); a pair of film-forming rollers (2, 2) disposed within the vacuum chamber (3) that are connected to both poles of an alternating current power source and around which a base material (W) is wound; a gas-supplying device (5) that supplies gas containing a source gas to a film-forming area (D) which is a portion of or all of the region that is on one side of a line linking the centers of rotation of the pair of film-forming rollers (2, 2); and a magnetic-field-generating device (7) that, by means of the alternating current power source being applied to each of the film-forming rollers (2, 2), forms a magnetic field that causes the source gas in a predetermined region to become plasma. The magnetic-field-generating device (7) causes the source gas in the region adjacent to the surface of the portion of the pair of film-forming rollers (2, 2) located within the film-forming area (D) to become plasma, forming a plasma region (P). The base material (W) is wound around the pair of film-forming rollers (2, 2) so as to pass through the plasma region (P).