发明名称 MANUFACTURING APPARATUS FOR DEPOSITING A MATERIAL AND AN ELECTRODE FOR USE THEREIN
摘要 A manufacturing apparatus for deposition of a material on a carrier body and an electrode for use with the manufacturing apparatus are provided. The manufacturing apparatus includes a housing that defines a chamber. The housing also defines an inlet for introducing a gas into the chamber and an outlet for exhausting the gas from the chamber. At least one electrode is disposed through the housing with the electrode at least partially disposed within the chamber. The electrode has an exterior surface. The exterior surface has a contact region that is adapted to contact a socket. A contact region coating is disposed on the contact region of the electrode for maintaining electrical conductivity between the electrode and the socket. The contact region coating has an electrical conductivity of at least 7x106 Siemens/meter at room temperature and a greater wear resistance than nickel as measured in mm3/N*m.
申请公布号 CA2777101(A1) 申请公布日期 2011.04.14
申请号 CA20102777101 申请日期 2010.10.08
申请人 HEMLOCK SEMICONDUCTOR CORPORATION 发明人 HILLABRAND, DAVID;MCCOY, KEITH
分类号 C23C16/44 主分类号 C23C16/44
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