发明名称 |
NAND FLASH MEMORY ARRAY HAVING PILLAR TYPE SINGLE CRYSTAL CHANNEL AND VIRTUAL SOURCE/DRAIN AND FABRICATION METHOD OF THE SAME |
摘要 |
<p>PURPOSE: A nand flash memory array having pillar type single crystal channel and a virtual source/drain and fabrication method of the same are provided to simply implement a plurality of gates by repeatedly depositing and etching an insulating film and a conductive film. CONSTITUTION: In a nand flash memory array having pillar type single crystal channel and a virtual source/drain and fabrication method of the same, a column(12) is formed on a substrate(10). A common source area(40) is formed on the substrate between columns to form a first impurity doping layer. A lower selection gate(53) is formed on a common source region and the column while having a first insulating layer(24a) between them. A word line is formed on the lower selection gate and the column. An upper selection gate(75) is formed on a conductive layer(74) and each column while having a third insulating film(67).</p> |
申请公布号 |
KR20110037470(A) |
申请公布日期 |
2011.04.13 |
申请号 |
KR20090094928 |
申请日期 |
2009.10.07 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
PARK, BYUNG GOOK;SHIM, WON BO |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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