发明名称 Fabrication of composite materials using atomic layer deposition
摘要 Methods of constructing composite films including particles embedded in a filler matrix involve preparing a collection of stacked particles, then depositing a matrix material throughout the particle collection using an atomic layer deposition (ALD) method so as to substantially completely fill the spaces between the particles with the matrix material. During matrix deposition, a vapor phase etch cycle may be periodically employed to avoid clogging of small pores in the particle collection. New composite materials formed by such methods are also disclosed.
申请公布号 US7923068(B2) 申请公布日期 2011.04.12
申请号 US20080030044 申请日期 2008.02.12
申请人 LOTUS APPLIED TECHNOLOGY, LLC 发明人 DICKEY ERIC R.;BARROW WILLIAM A.
分类号 B32B5/22;C23F1/00 主分类号 B32B5/22
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