| 发明名称 |
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method that can prevent a processing liquid from being left on a lift pin after drying a substrate, and thereby can prevent the processing liquid from being attached to the rear surface of the substrate after the liquid processing. <P>SOLUTION: A substrate cleaning apparatus 10 includes: a holding plate 30 for holding a substrate W; a lift pin plate 20 arranged above the holding plate 30 and having a lift pin 22 for supporting the substrate W from the lower side; and a processing liquid supply unit 40 for supplying the processing liquid to the rear surface of the substrate W held by the holding plate 30. The processing liquid supply unit 40 has a head part 42 formed so as to cover a through hole 20a of the lift pin plate 20. The processing liquid supply unit 40 and the lift pin plate 20 are configured so as to be relatively moved up and down against the holding plate 30. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
| 申请公布号 |
JP2011071477(A) |
申请公布日期 |
2011.04.07 |
| 申请号 |
JP20100137305 |
申请日期 |
2010.06.16 |
| 申请人 |
TOKYO ELECTRON LTD |
发明人 |
OGATA NOBUHIRO;NAGAMINE SHUICHI |
| 分类号 |
H01L21/683;H01L21/304;H01L21/306 |
主分类号 |
H01L21/683 |
| 代理机构 |
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| 主权项 |
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