METHOD FOR MANUFACTURING CUSHION LAYER FOR POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a cushion layer for a polishing pad allowing reduction of influence due to remaining distortion in relation to repeated load of a polishing layer with little dispersion of a compression characteristic and a small change of the compression characteristic due to flooding of slurry liquid.

SOLUTION: This method for manufacturing the cushion layer for the polishing pad includes: a process for molding a mixture containing energy ray curing resin into a sheet shape; a process for performing patterning of hardened parts and unhardened parts by a photolithography method on one surface of the obtained sheet; and a process for forming irregularities on one surface of the sheet by removing the unhardened parts.

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