| 摘要 |
A diffusion device (1; 28) for the production of solar cells comprises a first dopant source applicator {3) by means of which a dopant source (5) can be disposed on a substrate (7), a first continuous furnace (12) arranged downstream in the process direction (10) through which the substrates (7) can pass, by means of which dopant from the dopant source (5) can be diffused into the substrate (7), and a second continuous furnace (14; 44) arranged downstream of the first continuous furnace (12) in the process direction which is disposed such that a surface passivating layer is formed on the substrates (7) while they pass through the second continuous furnace (14; 44), and an etching device (16) disposed between the first (12) and the second (14; 44) continuous furnace which is arranged to at least partially remove layers formed at the surface of the substrates (7) during the passage through the first continuous furnace (12); and a process for producing solar cells (60). |
