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发明名称
Method for forming dielectric layer of semiconductor device
摘要
申请公布号
KR101026482(B1)
申请公布日期
2011.04.01
申请号
KR20070091792
申请日期
2007.09.10
申请人
发明人
分类号
H01L21/31
主分类号
H01L21/31
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代理人
主权项
地址
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