Method for manufacturing anionic polyelectrolyte layer utilized on fixed substrate i.e. hyper pure silicon-wafer, involves providing energy in aqueous solution of polyelectrolyte at surface of substrate to separate polyelectrolyte in layer

摘要

The method involves providing plenty of energy in an aqueous solution of polyelectrolyte at a surface of a substrate for local separation of polyelectrolyte in an ultra thin polyelectrolyte layer on the substrate, where thickness of the layer ranges from 0.3 to 10 nanometer. The energy is provided using a cantilever-measuring needle of a raster force microscope i.e. atomic force microscope, in an intermittent mode, during in-situ-scanning of the microscope. The electrolyte comprises methacrylic acid-group, and the aqueous solution comprises alkyl benzene sulfonate of alkali metal as tenside. An independent claim is also included for an ultrathin polyelectrolyte layer that is manufactured using the method.