DEPOSITED FILM FORMATION DEVICE AND DEPOSITED FILM FORMATION METHOD

摘要

Disclosed is a deposited film formation device that, in order to form a high quality film without the occurrence of surface unevenness in the quality of the film, is equipped with a chamber; a first electrode that is disposed within said chamber; a second electrode that is disposed within the aforementioned chamber at a prescribed distance from the first electrode, and that is provided with a plurality of supply units that supply a source gas; an introduction path through which the source gas is introduced, that is connected to the aforementioned supply units; a heating means that is disposed in said introduction path; and cooling mechanisms that cool the aforementioned second electrode.