发明名称 |
CLEANING LIQUID, CLEANING METHOD, CLEANING SYSTEM, AND METHOD FOR MANUFACTURING MICROSTRUCTURE |
摘要 |
According to embodiments, a cleaning liquid includes an oxidizing substance and hydrofluoric acid and exhibiting acidity. A cleaning method is disclosed. The method includes producing an oxidizing solution including an oxidizing substance by one selected from electrolyzing a sulfuric acid solution, electrolyzing hydrofluoric acid added to a sulfuric acid solution, and mixing a sulfuric acid solution with aqueous hydrogen peroxide. The method includes supplying the oxidizing solution and hydrofluoric acid to a surface of an object to be cleaned.
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申请公布号 |
US2011073489(A1) |
申请公布日期 |
2011.03.31 |
申请号 |
US20100880450 |
申请日期 |
2010.09.13 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;SHIBAURA MECHATRONICS CORPORATION;CHLORINE ENGINEERS CORP. LTD. |
发明人 |
HAYAMIZU NAOYA;TANGE MAKIKO;KUROKAWA YOSHIAKI;KOBAYASHI NOBUO;KATO MASAAKI;OGAWA YUSUKE;DOMON HIROKI |
分类号 |
C25F1/00;C25F7/00 |
主分类号 |
C25F1/00 |
代理机构 |
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代理人 |
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