METHOD FOR MEASURING AND CORRECTING ILLUMINANCE, AND EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring and correcting illuminance, in which illuminance on each photomask surface can be easily measured and corrected by using an exposure apparatus; and to provide the exposure apparatus having a plurality of exposure heads arranged in a direction perpendicular to the traveling direction of a glass substrate.

SOLUTION: The method includes: holding an illuminance measuring unit 70 on a mask conveyance tray 41 that has a mask holder 30 to mount a photomask PM3; aligning the illuminance measuring unit to a position corresponding to a photomask surface where illuminance is to be measured; and correcting the measured illuminance by comparing a reference illuminance on each photomask surface. An exposure head H includes a light source 80 and a mask holder, further includes a tray conveyance mechanism 40 that moves a mask conveyance tray to the mask holder, aligns the illuminance measuring unit to a position corresponding to a photomask surface, and measures and corrects the illuminance.

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