| 摘要 |
PROBLEM TO BE SOLVED: To solve the following problems: when a hard mask is used to form an oblique vapor deposition layer, it is difficult to eliminate misalignment due to a hard mask and misalignment due to dimensional error, and especially when vapor deposition particles wrap around to cover a stopper layer overlapping a seal area, the thickness of the seal area is the same as the sum of the original thickness of the seal area, and the thickness of the oblique vapor deposition layer parasitically generated by the vapor deposition particles, so that the thickness of a liquid crystal layer varies by the thickness of the oblique vapor deposition layer to cause display unevenness in a liquid crystal device. SOLUTION: An oblique vapor deposition layer precursor 18a' adhering to cover the stopper layer 110 is removed to form the oblique vapor deposition layer 18a. A CMP method is preferable for removing the oblique vapor deposition layer precursor 18a' covering the stopper layer 110. Since alignment is performed in a self-aligned manner, no misalignment occurs, and the oblique vapor deposition layer precursor 18a' can be removed with high shape accuracy to prevent display unevenness. COPYRIGHT: (C)2011,JPO&INPIT
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