SINTERED COMPLEX OXIDE, METHOD FOR PRODUCING SINTERED COMPLEX OXIDE, SPUTTERING TARGET AND METHOD FOR PRODUCING THIN FILM

摘要

A sintered complex oxide comprising metal oxide particles (a) having a hexagonal lamellar structure and containing zinc oxide and indium, and metal oxide particles (b) having a spinel structure and containing a metal element M (where M is aluminum and/or gallium), wherein the mean value of the long diameter of the metal oxide particles (a) is no greater than 10 µm, and at least 20% of the metal oxide particles (a) have an aspect ratio (long diameter/short diameter) of 2 or greater, based on the number of particles.