An electroless deposition system includes a deposition solution, and saturating the deposition solution with an oxygen concentration in a range from about two thousand parts per million to about twenty thousand parts per million.
申请公布号
US7913644(B2)
申请公布日期
2011.03.29
申请号
US20060537643
申请日期
2006.09.30
申请人
LAM RESEARCH CORPORATION
发明人
RULKENS RON;TAS ROBERT D.;KULKARNI SHASHANK RAVINDRA;KOLICS ARTUR;GILBERT NANCY E.
