发明名称 |
Cleaning method, cleaning apparatus and electro optical device |
摘要 |
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.
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申请公布号 |
USRE42248(E1) |
申请公布日期 |
2011.03.29 |
申请号 |
US20090411838 |
申请日期 |
2009.03.26 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HOSODA TOSHIKO;YOTSUYA SHINICHI |
分类号 |
B08B3/04;B08B3/08;B08B3/00;B08B3/12;C23C14/04;C23C14/24;H01L21/302;H01L21/44;H01L21/461;H01L51/50;H05B33/10;H05B33/14 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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