发明名称 |
HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. |
申请公布号 |
NL2005207(A) |
申请公布日期 |
2011.03.29 |
申请号 |
NL20102005207 |
申请日期 |
2010.08.11 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
JACOBS, JOHANNES;KATE, NICOLAAS;OTTENS, JOOST;DONK, GERRIT;ES, JOHANNES |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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