Unsymmetrical Ligand Sources, Reduced Symmetry Metal-Containing Compounds, and Systems and Methods Including Same

摘要

The present invention provides metal-containing compounds that include at least one &bgr;-diketiminate ligand, and methods of making and using the same. In some embodiments, the metal-containing compounds are homoleptic complexes that include unsymmetrical &bgr;-diketiminate ligands. In other embodiments, the metal-containing compounds are heteroleptic complexes including at least one &bgr;-diketiminate ligand. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for &bgr;-diketiminate ligands are also provided.