APPARATUS FOR DEPOSITTING THIN FILM

摘要

PURPOSE: A thin film depositing apparatus is provided to reduce heating time by filling a ceramic ball in a path through which gas flows. CONSTITUTION: A chamber provides a space for depositing a thin film on a substrate. A heater stage is installed in an inner space of the chamber and loads the substrate. A shower head(11) is installed on the upper side of the chamber and sprays deposition gas to the substrate. A backside gas feeding pipe(13) is connected to the feeding path formed on the heater stage and supplies backside gas to the substrate. A heating unit(19) is installed on the backside supply pipe and increases the temperature of the supplied backside gas.