发明名称 METHOD FOR PRODUCING COPPER THIN FILM AND COPPER THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a copper thin film capable of maintaining a low volume resistivity for a long period of time, and to provide a method for producing the copper thin film from a copper particle dispersion. SOLUTION: The method for producing the copper thin film includes at least two processes comprising a process (A) for applying a heating treatment using overheated steam to a coated film containing a copper particle dispersion, and a process (B) for applying a rust preventive treatment to the copper thin film layer obtained in the process (A). The copper thin film produced by the method is also provided. It is preferable that the coated film is a film obtained by applying the copper particle dispersion on an insulating substrate by coating or printing. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011058068(A) 申请公布日期 2011.03.24
申请号 JP20090210594 申请日期 2009.09.11
申请人 TOYOBO CO LTD 发明人 YATSUKA TSUYOSHI;AYUSAWA YOSHITAKA;KITSUMOTO HIROTOSHI;OGI KOJI
分类号 C23C24/08;B22F1/00;H01B5/02;H01B13/00 主分类号 C23C24/08
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