METHODS OF SOLID PHASE RECRYSTALLIZATION OF THIN FILM USING PULSE TRAIN ANNEALING METHOD
摘要
Embodiments of the present invention provide methods of solid phase recrystallization of thin film using a plurality of pulses of electromagnetic energy. In one embodiment, the methods of the present invention may be used to anneal an entire substrate surface or selected regions of a surface of a substrate by delivering a plurality of pluses of energy to a crystalline seed region or layer upon which an amorphous layer is deposited to recrystallize the amorphous layer so that it has the same grain structure and crystal orientation as that of the underlying crystalline seed region or layer.
申请公布号
WO2011034641(A1)
申请公布日期
2011.03.24
申请号
WO2010US35013
申请日期
2010.05.14
申请人
APPLIED MATERIALS, INC.;MOFFATT, STEPHEN;HUNTER, AARON MUIR;ADAMS, BRUCE E.
发明人
MOFFATT, STEPHEN;HUNTER, AARON MUIR;ADAMS, BRUCE E.