| 发明名称 |
FILM FORMING METHOD AND STORAGE MEDIUM |
| 摘要 |
<p>Disclosed is a film forming method whereby a substrate is contained inside a processing container, a film forming material containing cobalt amidinate and a reducing agent containing carboxylic acid are introduced into the processing container in vapour state, and a Co film is formed on the substrate.</p> |
| 申请公布号 |
WO2011033917(A1) |
申请公布日期 |
2011.03.24 |
| 申请号 |
WO2010JP64573 |
申请日期 |
2010.08.27 |
| 申请人 |
TOKYO ELECTRON LIMITED;KOJIMA YASUHIKO;AZUMO SHUJI |
发明人 |
KOJIMA YASUHIKO;AZUMO SHUJI |
| 分类号 |
C23C16/18;H01L21/28;H01L21/285;H01L21/288 |
主分类号 |
C23C16/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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