发明名称 Einkristall-Wachstumsverfahren und Einkristall-Ziehvorrichtung
摘要 <p>A silicon single crystal growth method of pulling up and growing a single crystal from a melt of a silicon raw material melted in a quartz crucible based on a Czochralski method, the method comprising the steps of: applying a direct current voltage in such a manner that an outer wall of the quartz crucible acts as a positive electrode and an electrode immersed into the melt of the silicon raw material acts as a negative electrode, the immersed electrode being placed separately from a pulling member for pulling the single crystal; and growing the single crystal with the pulling member while passing an electric current through the electrode, and a pulling apparatus thereof.</p>
申请公布号 DE112009000986(T5) 申请公布日期 2011.03.24
申请号 DE20091100986T 申请日期 2009.03.24
申请人 SHIN-ETSU HANDOTAI CO. LTD. 发明人 SUGAWARA, KOSEI;HOSHI, RYOJI;TAKAZAWA, MASANORI;MIYAHARA, YUUICHI;IWASAKI, ATSUSHI
分类号 C30B29/06;C30B15/00;C30B15/10 主分类号 C30B29/06
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