| 摘要 |
PROBLEM TO BE SOLVED: To improve the electron beam form in relation to an electron beam device for vacuum deposition. SOLUTION: In the electron beam device for vacuum deposition configured to deflect electron beams to an angle of 120° or more to irradiate a vapor deposition material stored in a crucible with the electron beams to deposit vapor from the vapor deposition material onto a substrate surface, the surface of a thermion emitting cathode 31 is oriented vertically to an electron beam emitting direction and the cathode 31 is configured to have a sectional surface that a cathode surface other than a cathode holding part 32a or a peripheral surface is not present within an angle of 90° relative to an effective thermion emitting surface of the cathode 31. COPYRIGHT: (C)2011,JPO&INPIT |
