LEAKAGE DETECTING METHOD OF PROCESS CHAMBER

摘要

PURPOSE: A method for detecting a leakage of a process chamber is provided to accurately determine whether a leakage occurs by checking whether a deviation rate change amount about the intensity comparison value of light emission corresponds to a preset deviation rate in a normal state. CONSTITUTION: A normal speculation deviation rate with regard to a peak value of reference intensity is set. A deviation rate of an actual peak value with regard to the intensity of plasma light emission is calculated. It is determined whether the deviation rate of the calculated actual peak value corresponds to the normal specification deviation rate with regard to the peak value of the preset intensity. If the deviation rate of the actual peak value corresponds to the normal specification deviation rate, it is determined that a leakage does not occur. If the deviation rate of the actual peak value dose not correspond to the normal specification deviation rate, it is determined that a leakage occurs.