| 摘要 |
<p>The present invention relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing: more specifically, it relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing with an enhanced level of homing processing repeatability and a capability for minimizing orthogonality errors at the time of Gantry stage homing processing used with semiconductors, FPD equipment or precision machining equipment ( Fig. 4 ).</p> |
