PHOTOSENSITIVE COMPOUND AND PHOTOSENSITIVE COMPOSITION INCLUDING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive compound that has excellent sensitivity and also improves residual film ratio characteristics, and to provide a photosensitive composition including the photosensitive compound that improves perpendicularity of a pattern created after a semiconductor photolithography process.

SOLUTION: The photosensitive compound contains a naphthoquinonediazide sulfonic acid ester compound having at least one naphthoquinonediazide sulfoxy group (-ODNQ), and having either at least one carboxyl group or alkoxy group having 1 to 8 carbon atoms, in one molecule.

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