| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily and surely prevent contamination of an inner surface of a protective cover, while a substrate is used. <P>SOLUTION: An exposure apparatus includes a reticle stage 11, which holds a reticle 37 placed inside a chamber 13 and projects light of a pattern image onto the wafer to the reticle 37. A first conveyance portion opens a second cover member for protecting a first cover member, in which the reticle 37 is stored to take the first cover member out and conveys the first cover member into the chamber 13. A second conveyance portion opens the first cover member in the chamber 13 and removes the reticle 37, conveys the reticle 37 to the reticle stage 11, and keeps the first cover member in a state with the member closed, after the reticle 37 is removed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
