ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an effect of improving the circularity of a pattern and allowing formation of a pattern with a good focus latitude, and to provide a pattern forming method using the composition.

SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, and (B) a compound expressed by general formula (1-1) or (1-2), which generates an acid by irradiation with actinic rays or radiation. The composition is characterized in that: the resin (A) contains a repeating unit having an acid decomposable group, and the content rate of the repeating unit is from 45 to 75 mol% with respect to the whole repeating units in the resin (A); and the content rate of the compound (B) is from 10 to 30 mass% on a basis of the whole solid content of the composition. In general formula (1-1), R13represents a hydrogen atom, fluorine atom, or the like; R14each independently represents, when plural R14are present, an alkyl group, a cycloalkyl group, or the like; R15each independently represents an alkyl group, a cycloalkyl group, or the like; l represents an integer of 0 to 2; r represents an integer of 0 to 8; and X-represents a non-nucleophilic anion. In general formula (1-2), M represents an alkyl group, a cycloalkyl group, or the like; R1cand R2ceach independently represent a hydrogen atom, an alkyl group, or the like; Rxand Ryeach independently represent an alkyl group, a cycloalkyl group, or the like; and X-represents a non-nucleophilic anion.

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