| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for stably storing slurry containing quadrivalent metal hydroxide particles distributed in water without fluctuating pH. SOLUTION: A method for storing slurry containing water and quadrivalent metal hydroxide particles distributed in water is disclosed, wherein carbon dioxide absorbent is stored in a container without being directly brought into contact with the slurry, and it is desired that the carbon dioxide absorbent is wrapped with wrapping materials, at least partially provided with water resistance and gas permeability. This slurry is used for grinding in the planarization process of the surface of the substrate in the case of manufacturing a semiconductor element. COPYRIGHT: (C)2011,JPO&INPIT |
